Rainbow Research Optics, Inc. offers a variety of mirrors for handling the many ranges and high powers of excimer lasers. These mirrors cover the laser lines of ArF (λ = 193 nm) and XeF (λ = 352 nm). These external cavities, high-energy excimer laser mirrors have been designed to withstand high pulsed powers. Each optic provides better than λ/10 surface flatness and surface finishes of 10-5 scratch-dig.

Features:

ArF and XeF Excimer Laser Line Mirrors
High Damage Threshold

Substrate material: UV CaF2 or VUV MgF2
Surface Figure: λ/10 @ 633nm
Surface Quality: 20-10 laser quality
Diameter Tolerance: +0.0/-0.20 mm
Thickness Tolerance: ±0.25 mm
Wedge: <3 are min.
Reflectance: R > 97% at 633nm and R > 99.5% at 248nm ~ 353nm
Clear Aperture: >85% of diameter
Chamfer:  0.3mm at 45 typical
Damage Thredold: 1j/cm2  10nsec pulse
Adhesion Threshold: Per MIL-C-675APer MIL-C-675A



 

HOW TO ORDER


* Other percentage of reflection and dimensions available in prototype and production quantities.